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Sputtering Target

  • Tantalum Target
    Tantalum Target
    1.Material: Pure Tantalum
    2.Standard : ASTM B708 RO5200
    3.Purity:≥99.90% or 99.99%
    4.Type:Circular target ,Rectangular target
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  • Molybdenum Target
    Molybdenum Target
    1.Product name:Molybdenum Target
    2.Metaril:Mo
    3.Purity:99.9%
    4.Plate Target: Weight:≤200kg/pc, Length:≤Φ165mmΧ1000mm
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  • Nickel Target
    Nickel Target
    1.Product name:Nickel plate/Nickel target
    2.Purity :99.6%,99.9%,99.99%
    3.Condition:annealed or unannealed
    4.Application:Nickel plate could be used as sputtering target in PVD (Physical Vapor Deposition) coating, anode plate in electronic...
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  • Titanium Target
    Titanium Target
    1.Material:Pure Titanium target
    2.Purity: 99.5% - 99.995%
    3.Size:customed
    4.Xi’an Econ provides all kinds of pure titanium plates, bars and other alloys.
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  • Niobium Target
    Niobium Target
    1.Product name:Niobium target
    2.Standard :ASTM B393 RO4200-1,RO4210-1
    3.type:Rectangular targetand circular target
    4.Purity:≥99.90% or 99.95%
    5.Application:Niobium target is used as decoration coating film and optical films of cold...
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  • Tungsten Target
    Tungsten Target
    1.Product name : Tungsten Target
    2.Shape:Circular target,Rotatable target and Rectangular target
    3.Size:Dia:60-200mm, Length:200-1000mm,Thickness:5-30mm
    4.Surface: smoothing, CNC machining, polishing
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