Sputtering Target

Tantalum Target

1.Material: Pure Tantalum . 2.Standard : ASTM B708 RO5200. 3.Purity:≥99.90% or 99.99%. 4.Type:Circular target ,Rectangular target.

Molybdenum Target

1.Product name:Molybdenum Target. 2.Metaril:Mo. 3.Purity:99.9%. 4.Plate Target: Weight:≤200kg/pc, Length:≤Φ165mmΧ1000mm

Nickel Target

1.Product name:Nickel plate/Nickel target. 2.Purity :99.6%,99.9%,99.99%. 3.Condition:annealed or unannealed. 4.Application:Nickel plate could be used as sputtering target in PVD (Physical Vapor

Titanium Target

1.Material:Pure Titanium target. 2.Purity: 99.5% - 99.995%. 3.Size:customed. 4.Xi’an Econ provides all kinds of pure titanium plates, bars and other alloys.

Niobium Target

1.Product name:Niobium target. 2.Standard :ASTM B393 RO4200-1,RO4210-1. 3.type:Rectangular targetand circular target. 4.Purity:≥99.90% or 99.95%. 5.Application:Niobium target is used as decoration

Tungsten Target

1.Product name : Tungsten Target. 2.Shape:Circular target,Rotatable target and Rectangular target. 3.Size:Dia:60-200mm, Length:200-1000mm,Thickness:5-30mm. 4.Surface: smoothing, CNC machining,