With the development of the times, in order to meet the requirements of safety, energy saving, noise reduction and pollutant emission reduction, vacuum plating has become a new trend of environmental protection in the surface treatment process. Different from general electroplating, vacuum plating is more environmentally friendly. At the same time, vacuum plating can produce a good glossiness black effect which can not be achieved by ordinary electroplating.
Vacuum plating is basically a physical deposition phenomenon, which is that argon is injected into the target in vacuum state, and the target is separated into molecules which are adsorbed by conductive goods to form a uniform and smooth surface layer. In the process of electroplating, the target is very important. What are the applications of the target in the process of vacuum plating? Today, Sifeng editor will give you a detailed introduction.
In general, the application of targets in vacuum plating has the following characteristics:
(1) metal, alloy or insulator can be made into film material.
(2) under proper setting conditions, multiple and complex targets can be made into the same film.
(3) the mixture or compound of target substance and gas molecule can be made by adding oxygen or other active gases into the discharge atmosphere.
(4) the input current and sputtering time of the target can be controlled, and high precision film thickness can be easily obtained.
(5) compared with other processes, it is more advantageous to produce large area homogeneous films.
(6) the sputtered particles are not affected by gravity, and the position of target and substrate can be arranged freely.
(7) the adhesion strength between the substrate and the film is more than 10 times that of the general evaporation coating, and due to the high energy of the sputtered particles, the hard and dense film will continue to diffuse on the film forming surface, at the same time, the high energy makes the substrate as long as the lower temperature can get the crystalline film.
